Laser nanoFab Logo

Select your language

The characterization and quality control of multilayer mirrors, masks and optical components for the extreme ultraviolet lithography requires a compact, stable and debris-free light source. Laser nanoFab GmbH offers such a light source for metrology, which is based on the electron-induced characteristic emission of solid targets.

We use cookies

We use cookies on our website. Some of them are essential for the operation of the site, while others help us to improve this site and the user experience (tracking cookies). You can decide for yourself whether you want to allow cookies or not. Please note that if you reject them, you may not be able to use all the functionalities of the site.