EUV Tube

EUV Tube applicationThe characterization and quality control of multilayer mirrors, masks and optical components for the extreme ultraviolet lithography requires a compact, stable and debris-free light source. Laser nanoFab GmbH offers such a light source for metrology, which is based on the electron-induced characteristic emission of solid targets.
 
  • Microfocus EUV tube for at-wavelength reflectometry
  • Electron-based EUV source
  • Debris-free operation
  • Long-term stable, low fluctuations
  • EUV power of about 20µW (2π sr, 2% bw)
  • very low running costs
  • automatic start-up
  • computer-controlledDirect EUV Tube emission spectrum (green), and spectrum after two multilayer mirror reflections (blue)

Figure: Direct EUV Tube emission spectrum (green), and spectrum after two multilayer mirror reflections (blue)

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